Book Description
This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons.
Customer Reviews:
Better than Bittencourt........2007-07-04
Good solid introduction to plasma physics. Fairly general introduction geared towards advanced undergraduates and grad students. There are better books which concentrate on applications, both of which I own. Sturrock for geophysical and earth plasma physics and Kulsrud for astrophysics.
Plasma physicists do it with confinement.......2007-02-10
I took an intro to plasma physics class using this book at the undergraduate level - and this book was perfect. It has a good blend of experimental evidence, theory, and math. The derivations are really good, you can follow along in the margins. The pictures are clear and beautiful, the page layout easy on the eyes. This is not a graduate text, but aimed at the advanced undergrad level. You should already know calculus, complex analysis, EM, and linear algebra before learning this material.
Clearly and simplified.......2007-01-24
The texts of this book are not long,but are very clear in physics concepts and are simplied:
1.All important math steps to prove the physics are mentioned(not released to the reader) in simplied way so that readers can know clearly both the math steps and physics meanings without being buffered by complecated math steps.
2.The author mentioned clearly the physics meaning of any equation.
I am a bachalor of physics,such kind of textbook(clear and simple and friendly) I had had only two:textbook named "Introduction to Electrodynamic" and "Introduction to Quantum Mechanics" written by famous author,Mr. Grify.
As a result,I think it is a very good textbook,at least for students who start to learn plamsa physics.
Really not a graduate text.......2007-01-04
I picked up this book for my graduate plasma 1 class alongside Goldston's book. The material is geared towards undergrads and would have been great had I picked up the book two years ago. Instead I found that I hardly opened Chen and stuck with Goldston or course notes. So if you are an undergrad or someone who is just generally interested in plasma physics this is probably what you should be buying. If you are a grad student and don't have it already then there is a decent chance that if you buy this book all you will get out of it is a warm feeling in your heart from knowing that you have the same book on your shelf that every other plasma physicist has.
It Just Keeps Coming in Handy.......2005-10-18
I first bought this text for an undergraduate course in plasmas, and I liked it then -- Chen's first few chapters will get you through the basics without any undue suffering (you'll hurt because the subject can be difficult, not because the text is unclear.) After spending a few months on my shelf, it reappeared for some research I was doing that required me to get comfortable with a few different types of plasma waves. Now Chen has come back into my life -- I'm taking a graduate course in kinetic theory of plasmas, and I find myself opening up this book on a daily basis to figure something out. This textbook has served me well, and if you're doing work (coursework or research) in the plasmas field, it will likely serve you well, too. The first four or five chapters are written so that a senior-level physics undergrad can understand them, so you get a nice conceptual grasp of the subject (as well as good reference material on more advanced topics.)
One point: I wouldn't recommend buying this as a "teach yourself plasma physics on a desert island" kind of book. If you can find someone who knows the subject, though, Chen will help you to learn a lot after they've explained a few basic points.
Basic subjects covered are:
Orbit theory (single particle motion, adiabatic invariants)
Fluid approximation
Plasma waves (O, X, R, L, acoustic, and many others)
Diffusion and resistivity
Equilibrium/stability issues
Kinetic theory
Assorted non-linear effects
Book Description
The raw numbers of high-energy-density physics are amazing: shock waves at hundreds of km/s (approaching a million km per hour), temperatures of millions of degrees, and pressures that exceed 100 million atmospheres. This book introduces the reader to the fundamental tools and discoveries of high-energy-density physics. It surveys the production of high-energy-density conditions, the fundamental plasma and hydrodynamic models that can describe them and the problem of scaling from the laboratory to the cosmos. Connections to astrophysics will be discussed throughout. The book is intended to support coursework in high-energy-density physics, to meet the needs of new researchers in this field, and also to serve as a useful reference on the fundamentals.
Average customer rating:
- Review of Handbook of PIII and PII&D
- Review of Handbook of PIII and PII&D
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Handbook of Plasma Immersion Ion Implantation and Deposition
Manufacturer: Wiley-Interscience
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ASIN: 0471246980 |
Book Description
This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.
Customer Reviews:
Review of Handbook of PIII and PII&D.......2002-05-07
This book is a very good in discussing Plasma Immersion Ion Implantation (PIII). It falls down somewhat when discussing Plasma Immersion Ion Implantation and Deposition (PIII&D). The chapters on plasma generation and plasma-surface interactions are very good. There are some interesting treatments on bombardment over complex surfaces. The chapters on Technology are quite good. A limitation of PIII is the rather shallow depth of material modification (~100nm), unless there is appreciable temperature to allow diffusion. The addition of concurrent film deposition to PIII (PIII&D), either from PVD or CVD sources, allows thicker layers to be built up. This also introduces nucleation, interface, film growth and gas incorporation effects to the process. In Chapter 3, "Ion Implantation and Thin-Film Deposition" the authors attempt to discuss these effects though they limit the discussion to the IBAD (Ion Beam Assisted Deposition) process and essentially ignore the large amount of work that has been done on plasma-based ion-assisted deposition (ion plating), particularly that using pulsed biasing, that would seem to be more akin to the PIII&D process. This is overcome somewhat in the discussion of applications since plasma-based ion-assisted deposition is much more widely used in industry than is IBAD. The Application section has a number of interesting examples of development work on PIII and PIII&D for application but few examples of actual use in industry though I am sure that they will follow. The book is unusual in that it cites a number of patents and even has a section on "Survey of PIII&D Intellectual Property."
My feeling is that some of the authors were not very well acquainted with the PVD literature. For example, they use the term "ion hammering" for film densification by ion bombardment whereas the PVD community has used the term "ion peening" for that effect for quite some time. Overall I highly recommend the book as one that points the way to new methods and applications for the vacuum coating industry.
Review of Handbook of PIII and PII&D.......2002-05-07
This book is a very good in discussing Plasma Immersion Ion Implantation (PIII). It falls down somewhat when discussing Plasma Immersion Ion Implantation and Deposition (PIII&D). The chapters on plasma generation and plasma-surface interactions are very good. There are some interesting treatments on bombardment over complex surfaces. The chapters on Technology are quite good. A limitation of PIII is the rather shallow depth of material modification (~100nm), unless there is appreciable temperature to allow diffusion. The addition of concurrent film deposition to PIII (PIII&D), either from PVD or CVD sources, allows thicker layers to be built up. This also introduces nucleation, interface, film growth and gas incorporation effects to the process. In Chapter 3, "Ion Implantation and Thin-Film Deposition" the authors attempt to discuss these effects though they limit the discussion to the IBAD (Ion Beam Assisted Deposition) process and essentially ignore the large amount of work that has been done on plasma-based ion-assisted deposition (ion plating), particularly that using pulsed biasing, that would seem to be more akin to the PIII&D process. This is overcome somewhat in the discussion of applications since plasma-based ion-assisted deposition is much more widely used in industry than is IBAD. The Application section has a number of interesting examples of development work on PIII and PIII&D for application but few examples of actual use in industry though I am sure that they will follow. The book is unusual in that it cites a number of patents and even has a section on "Survey of PIII&D Intellectual Property."
My feeling is that some of the authors were not very well acquainted with the PVD literature. For example, they use the term "ion hammering" for film densification by ion bombardment whereas the PVD community has used the term "ion peening" for that effect for quite some time. Overall I highly recommend the book as one that points the way to new methods and applications for the vacuum coating industry.
Book Description
Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear fundamental introduction to virtually all aspects of modern plasma science and technology. These areas include: plasma chemistry and engineering, combustion, chemical physics, lasers, electronics and new methods of material treatment, fuel conversion and environmental control.
The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and a large number of problems and concept questions. As a foundational text, Plasma Physics and Engineering is ideal for senior undergraduate and graduate students in mechanical, chemical and electrical engineering, as well as for scientists and engineers studying phenomena taking place in cold and thermal discharge plasmas, in combustion, and laser systems.
Customer Reviews:
excellent text, 5 stars if it wasn't for the typos.......2006-11-04
This is a great reference, with wonderful physical insight into plasma kinetics mechanisms. Unfortunately the astonishing work of the authors is undermined by minor typos from the editor, which may throw off beginners- equations where charges or species don't add up, and the like. I could not find an errata yet, therefore only the 4 stars; but sincere congrats to the authors for such indepth and insightful work.
book for plasma engineers.......2004-05-27
This book focuses on the most important and fundamental issues of
plasma physics and applications in today's industry. It provides an
excellent introduction and overview of plasma. It covers almost all
aspects of plasma physics and engineering and has a lot of useful
examples.
In this book, author gave a thorough consideration of the theory of
breakdown phenomena leading to formation of different plasma
discharges and finally covered, in considerable depth, the physics and
main features behind the major discharges intensively used in
cutting-edge technologies. Along with the well known material, the
most interesting and important innovations in area of plasma physics
are also gathered and discussed.
It is extremely useful as reference and textbook. I highly recommend it to anyone interested in plasma.
Average customer rating:
- Review of Handbook of Vacuum Arc Science
- Review of Handbook of Vacuum Arc Science
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Handbook of Vacuum Arc Science and Technology: Fundamentals and Applications (Materials Science and Process Technology Series)
Manufacturer: Noyes Publications
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A User's Guide to Vacuum Technology
ASIN: 0815513755 |
Book Description
The vacuum arc is a high current, low voltage electrical discharge between two electrodes situated in a vacuum ambient. The vacuum arc is distinguished from other electrical discharges in that the discharge itself creates the plasma medium which conducts its electrical current. Explaining how this self-organization wonder comes about, and how this phenomena can be used for practical applications are objectives of this book.
Vacuum Arc Science and Technology is a comprehensive text describing the basic physics and technological applications of vacuum arcs. These high current electrical discharges create their own conducting medium by vaporizing and ionizing material from the arc electrodes, to form an energetic, highly ionized, metal vapor plasma.
Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant inter-electrode plasma.
Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
This text represents the first major update on both the physics of the cathodic arc and the technology and applications of arc devices. The previous major text by Lafferty, Vacuum Arcs, Theory and Application, was published 14 years ago and arc science and technology has since made considerable headway. The book covers the known facts of the cathodic arc and contributions by experts in the field discuss some of the theoretical models presently available.
The processes of thin film growth are covered and discussed in the context of the attractive features of low energy ion fluxes emanating from the cathodic spot. The technological problems of filtering undesirable micro-droplets from the arc plasma are discussed in relation to evaporation source design. Also discussed for the first time are some of the unique developments in arc technology that have taken place in the previous Soviet Union. Emphasis has also been placed on the properties of thin films deposited by arc evaporation, applications for such coatings and emerging opportunities for arc technology.
This book will be of great value to research workers in the field, the student requiring back- ground information on this emerging technology, the industrial worker presently using arc evaporation and/or complementary deposition techniques or considering its use. The book represents the state of the art of arc science and technology as presented by leading expert scientists working in theoretical and experimental areas.
Customer Reviews:
Review of Handbook of Vacuum Arc Science.......2002-05-09
This book should remain the seminal work on the subject of vacuum (and low-pressure gaseous) cathodic and anodic arcs for some time to come. One major plus is the significant number of Russian contributors. The Russians have made many contributions to this field but their work is seldom recognized. It is to the editors credit that they overcame the problems associated with incorporating their work in this book. The book has a chapter on the deposition of coatings, primarily reactive deposition of hard coatings, using arc sources. I think that one thing that is missing from the treatment is the effect of the arc on plasma chemistry. Arcs are very efficient in "activating" reactive gases and decomposing chemical vapor precursors which is important in reactive deposition processes. The cathodic arc also has the advantage in coating deposition that it moves over the whole target surface and thus prevents "poisoning" of some areas on the target surface which can be a problem in magnetron reactive sputter deposition.
Review of Handbook of Vacuum Arc Science.......2002-05-09
This book should remain the seminal work on the subject of vacuum (and low-pressure gaseous) cathodic and anodic arcs for some time to come. One major plus is the significant number of Russian contributors. The Russians have made many contributions to this field but their work is seldom recognized. It is to the editors credit that they overcame the problems associated with incorporating their work in this book. The book has a chapter on the deposition of coatings, primarily reactive deposition of hard coatings, using arc sources. I think that one thing that is missing from the treatment is the effect of the arc on plasma chemistry. Arcs are very efficient in "activating" reactive gases and decomposing chemical vapor precursors which is important in reactive deposition processes. The cathodic arc also has the advantage in coating deposition that it moves over the whole target surface and thus prevents "poisoning" of some areas on the target surface which can be a problem in magnetron reactive sputter deposition.
Book Description
The Physics of Plasmas provides a comprehensive introduction to the subject, illustrating the basic theory with examples drawn from fusion, space and astrophysical plasmas. Various aspects of plasma physics are discussed, beginning with particle orbit theory, and including fluid equations, a variety of magnetohydrodynamic (MHD) models, wave equations and kinetic theory. The relationships between these distinct approaches are discussed. In this way, the reader gains a firm grounding in the fundamentals, leading to an understanding of some of the more specialized topics. Throughout the text, there is an emphasis on the physical interpretation of plasma phenomena; Exercises are included.
Download Description
The Physics of Plasmas provides a comprehensive introduction to the subject, illustrating the basic theory with examples drawn from fusion, space and astrophysical plasmas. A particular strength of the book is its discussion of the various models used to describe plasma physics and the relationships between them. These include particle orbit theory, fluid equations, ideal and resistive magnetohydrodynamics, wave equations and kinetic theory. The reader will gain a firm grounding in the fundamentals, and develop this into an understanding of some of the more specialised topics. Throughout the text, there is an emphasis on the physical interpretation of plasma phenomena. Exercises are provided throughout. Advanced undergraduate and graduate students of physics, applied mathematics, astronomy and engineering will find a clear but rigorous explanation of the fundamental properties of plasmas with minimal mathematical formality. This book will also appeal to research physicists, nuclear and electrical engineers.
Book Description
Fundamentals of Plasma Physics is a general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory, with applications to a variety of important plasma phenomena. Its clarity and completeness makes the text suitable for self-learning and for self-paced courses.
Throughout the text the emphasis is on clarity, rather than formality, the various derivations are explained in detail and, wherever possible, the physical interpretations are emphasized. The mathematical treatment is set out in great detail, carrying out the steps which are usually left to the reader. The problems form an integral part of the text and most of them were designed in such a way as to provide a guideline, stating intermediate steps with answers.
Customer Reviews:
Too much math, not enough applications for me.......2006-01-03
This text was not what I was expecting. My interest is in semiconductors and I was looking for an introductory textbook on the physics underlying different types of plasma processing which could serve as an updated version of Glow Discharge Processes by Chapman.
This text has very little to do with applications and consists largely of page after page of calculus. My interest is in semiconductor processing which is not mentioned in the section on applications: Chapter 1 section 4.
Do not buy this unless your understanding of advanced calculus is very solid.
Plasma Goodness.......2005-08-02
I'm currently a student working in plasma research facility. I had a problem in the fact that I could not take the plasma physics course that is offered here for scheduling reasons. I therefor needed a book that has all the basics of plasma physics, yet is simple enough that i could teach myself this field of physics. This books is exactly that. For any student with a good background in electricity and magnetism, this book will pick up right from the maxwell equations and derives all the needed equations quite explicitly making the reading much easier to follow. Also, the good thing about this book is the sheer amount of material it covers on the topic. It contains all the basics an undergrade needs to know and even for graduate students, it is a great read. It is well written and never boring. For it's explicitness and it's broadness of topics, I absolutely recomend this book.
Customer Reviews:
classical.......2005-09-01
this is a classical review of plasma waves...excellent in order to calculate wave propagation in inhomgeneous, magnetoactive and isotropic plasma. Excellent review of E,H reflection coefficients, etc
Average customer rating:
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Kinetic Theory of Gases and Plasmas (Fundamental Theories of Physics)
PPJM Schram
Manufacturer: Springer
ProductGroup: Book
Binding: Hardcover
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ASIN: 0792313925 |
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Controlled Fusion and Plasma Physics
Kenro Miyamoto
Manufacturer: Taylor & Francis
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ASIN: 1584887095 |
Book Description
Resulting from ongoing, international research into fusion processes, the International Tokamak Experimental Reactor (ITER) is a major step in the quest for a new energy source. The first graduate-level text to cover the details of ITER, Controlled Fusion and Plasma Physics introduces various aspects and issues of recent fusion research activities through the shortest access path. The distinguished author breaks down the topic by first dealing with fusion and then concentrating on the more complex subject of plasma physics. The book begins with the basics of controlled fusion research, followed by discussions on tokamaks, reversed field pinch (RFP), stellarators, and mirrors. The text then explores ideal magnetohydrodynamic (MHD) instabilities, resistive instabilities, neoclassical tearing mode, resistive wall mode, the Boltzmann equation, the Vlasov equation, and Landau damping. After covering dielectric tensors of cold and hot plasmas, the author discusses the physical mechanisms of wave heating and noninductive current drive. The book concludes with an examination of the challenging issues of plasma transport by turbulence, such as magnetic fluctuation and zonal flow. Controlled Fusion and Plasma Physics clearly and thoroughly promotes intuitive understanding of the developments of the principal fusion programs and the relevant fundamental and advanced plasma physics associated with each program.
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