Book Description
The raw numbers of high-energy-density physics are amazing: shock waves at hundreds of km/s (approaching a million km per hour), temperatures of millions of degrees, and pressures that exceed 100 million atmospheres. This book introduces the reader to the fundamental tools and discoveries of high-energy-density physics. It surveys the production of high-energy-density conditions, the fundamental plasma and hydrodynamic models that can describe them and the problem of scaling from the laboratory to the cosmos. Connections to astrophysics will be discussed throughout. The book is intended to support coursework in high-energy-density physics, to meet the needs of new researchers in this field, and also to serve as a useful reference on the fundamentals.
Average customer rating:
- Review of Handbook of Vacuum Arc Science
- Review of Handbook of Vacuum Arc Science
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Handbook of Vacuum Arc Science and Technology: Fundamentals and Applications (Materials Science and Process Technology Series)
Manufacturer: Noyes Publications
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A User's Guide to Vacuum Technology
ASIN: 0815513755 |
Book Description
The vacuum arc is a high current, low voltage electrical discharge between two electrodes situated in a vacuum ambient. The vacuum arc is distinguished from other electrical discharges in that the discharge itself creates the plasma medium which conducts its electrical current. Explaining how this self-organization wonder comes about, and how this phenomena can be used for practical applications are objectives of this book.
Vacuum Arc Science and Technology is a comprehensive text describing the basic physics and technological applications of vacuum arcs. These high current electrical discharges create their own conducting medium by vaporizing and ionizing material from the arc electrodes, to form an energetic, highly ionized, metal vapor plasma.
Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant inter-electrode plasma.
Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
This text represents the first major update on both the physics of the cathodic arc and the technology and applications of arc devices. The previous major text by Lafferty, Vacuum Arcs, Theory and Application, was published 14 years ago and arc science and technology has since made considerable headway. The book covers the known facts of the cathodic arc and contributions by experts in the field discuss some of the theoretical models presently available.
The processes of thin film growth are covered and discussed in the context of the attractive features of low energy ion fluxes emanating from the cathodic spot. The technological problems of filtering undesirable micro-droplets from the arc plasma are discussed in relation to evaporation source design. Also discussed for the first time are some of the unique developments in arc technology that have taken place in the previous Soviet Union. Emphasis has also been placed on the properties of thin films deposited by arc evaporation, applications for such coatings and emerging opportunities for arc technology.
This book will be of great value to research workers in the field, the student requiring back- ground information on this emerging technology, the industrial worker presently using arc evaporation and/or complementary deposition techniques or considering its use. The book represents the state of the art of arc science and technology as presented by leading expert scientists working in theoretical and experimental areas.
Customer Reviews:
Review of Handbook of Vacuum Arc Science.......2002-05-09
This book should remain the seminal work on the subject of vacuum (and low-pressure gaseous) cathodic and anodic arcs for some time to come. One major plus is the significant number of Russian contributors. The Russians have made many contributions to this field but their work is seldom recognized. It is to the editors credit that they overcame the problems associated with incorporating their work in this book. The book has a chapter on the deposition of coatings, primarily reactive deposition of hard coatings, using arc sources. I think that one thing that is missing from the treatment is the effect of the arc on plasma chemistry. Arcs are very efficient in "activating" reactive gases and decomposing chemical vapor precursors which is important in reactive deposition processes. The cathodic arc also has the advantage in coating deposition that it moves over the whole target surface and thus prevents "poisoning" of some areas on the target surface which can be a problem in magnetron reactive sputter deposition.
Review of Handbook of Vacuum Arc Science.......2002-05-09
This book should remain the seminal work on the subject of vacuum (and low-pressure gaseous) cathodic and anodic arcs for some time to come. One major plus is the significant number of Russian contributors. The Russians have made many contributions to this field but their work is seldom recognized. It is to the editors credit that they overcame the problems associated with incorporating their work in this book. The book has a chapter on the deposition of coatings, primarily reactive deposition of hard coatings, using arc sources. I think that one thing that is missing from the treatment is the effect of the arc on plasma chemistry. Arcs are very efficient in "activating" reactive gases and decomposing chemical vapor precursors which is important in reactive deposition processes. The cathodic arc also has the advantage in coating deposition that it moves over the whole target surface and thus prevents "poisoning" of some areas on the target surface which can be a problem in magnetron reactive sputter deposition.
Book Description
Fundamentals of Plasma Physics is a general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory, with applications to a variety of important plasma phenomena. Its clarity and completeness makes the text suitable for self-learning and for self-paced courses.
Throughout the text the emphasis is on clarity, rather than formality, the various derivations are explained in detail and, wherever possible, the physical interpretations are emphasized. The mathematical treatment is set out in great detail, carrying out the steps which are usually left to the reader. The problems form an integral part of the text and most of them were designed in such a way as to provide a guideline, stating intermediate steps with answers.
Customer Reviews:
Too much math, not enough applications for me.......2006-01-03
This text was not what I was expecting. My interest is in semiconductors and I was looking for an introductory textbook on the physics underlying different types of plasma processing which could serve as an updated version of Glow Discharge Processes by Chapman.
This text has very little to do with applications and consists largely of page after page of calculus. My interest is in semiconductor processing which is not mentioned in the section on applications: Chapter 1 section 4.
Do not buy this unless your understanding of advanced calculus is very solid.
Plasma Goodness.......2005-08-02
I'm currently a student working in plasma research facility. I had a problem in the fact that I could not take the plasma physics course that is offered here for scheduling reasons. I therefor needed a book that has all the basics of plasma physics, yet is simple enough that i could teach myself this field of physics. This books is exactly that. For any student with a good background in electricity and magnetism, this book will pick up right from the maxwell equations and derives all the needed equations quite explicitly making the reading much easier to follow. Also, the good thing about this book is the sheer amount of material it covers on the topic. It contains all the basics an undergrade needs to know and even for graduate students, it is a great read. It is well written and never boring. For it's explicitness and it's broadness of topics, I absolutely recomend this book.
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Kinetic Theory of Gases and Plasmas (Fundamental Theories of Physics)
PPJM Schram
Manufacturer: Springer
ProductGroup: Book
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ASIN: 0792313925 |
Book Description
This rigorous explanation of plasmas is relevant to diverse plasma applications such as controlled fusion, astrophysical plasmas, solar physics, magnetospheric plasmas, and plasma thrusters. More thorough than previous texts, this book exploits powerful new mathematical techniques to develop deeper insights into plasma behavior. After developing the basic plasma equations from first principles, the book explores single particle motion with particular attention to adiabatic invariance. The author then examines types of plasma waves and the issue of Landau damping. Magnetohydrodynamic equilibrium and stability are tackled with emphasis on the topological concepts of magnetic helicity and self-organization. Advanced topics follow, including magnetic reconnection, nonlinear waves, and the Fokker-Planck treatment of collisions. The book concludes by discussing unconventional plasmas such as non-neutral and dusty plasmas. Written for beginning graduate students and advanced undergraduates, this text emphasizes the fundamental principles that apply across many different contexts.
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- ECR Plasma Etching
- understanding plasma processes
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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology, 7)
M. Sugawara ,
Barry L. Stansfield ,
S. Handa ,
K. Fujita ,
S. Watanabe , and
T. Tsukamoto
Manufacturer: Oxford University Press, USA
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ASIN: 019856287X |
Book Description
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Customer Reviews:
ECR Plasma Etching.......2001-05-17
One of the only books available that contain theoretical and practicle information on ECR etching. A must for any etch engineers working in the semiconductor industry.
understanding plasma processes.......2000-12-29
Gives a detailed physical understanding on the fundamentals of plasma processes including Inductively Coupled Plasma and current advancements in etching processes.
Average customer rating:
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Fundamentals of Beam Physics
James B. Rosenzweig
Manufacturer: Oxford University Press, USA
ProductGroup: Book
Binding: Hardcover
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ASIN: 0198525540 |
Book Description
This book presents beam physics using a unified approach, emphasizing basic concepts and analysis methods. While many existing resources in beams and accelerators are specialized to aid the professional practitioner, this text anticipates the needs of physics students. The central concepts underpinning the physics of accelerators, charged particle, and photon beams are built up from familiar, intertwining components, such as electromagnetism, relativity, and Hamiltonian dynamics. These components are woven into an illustrative set of examples that allow investigation of a variety of physical scenarios. With these tools, single particle dynamics in linear accelerators are discussed, with general methods that are naturally extended to circular accelerators. Beyond single particle dynamics, the proliferation of commonly used beam descriptions are surveyed and compared. These methods provide a powerful connection between the classical charged particle beams, and beams based on coherent waves - laser beams. Aspects of experimental techniques are introduced. Numerous exercises, and examples drawn from devices such as synchrotrons and free-electron lasers, are included to illustrate relevant physical principles.
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Basic Data of Plasma Physics: The Fundamental Data on Electrical Discharges in Gases (AVS Classics in Vacuum Science and Technology)
Sanborn C. Brown
Manufacturer: American Institute of Physics
ProductGroup: Book
Binding: Paperback
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ASIN: 156396273X |
Book Description
Market: Scientists, engineers, and graduate students involved in the phenomenon of plasma physics. This 1966 reference work is a compilation of some of the most important plasma physics measurements published during the late 1950s and the early 1960s. It offers a wealth of useful information on elastic-collision and charge- transfer cross sections, mobility and diffusion, electron attachment and detachment, and recombination. Numerous fundamental principles make this a much-consulted handbook on the physical phenomena, measurements, and properties of plasma physics.
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Trapped Charged Particles and Fundamental Physics (AIP Conference Proceedings / Plasma Physics)
Manufacturer: American Institute of Physics
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ASIN: 1563967766 |
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- excellent overview of the foundamentals
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Cold Plasma in Materials Fabrication: From Fundamentals to Applications
Alfred Grill
Manufacturer: IEEE Computer Society Press
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ASIN: 0780310551 |
Book Description
Cold plasma research and development activities, as well as its applications in materials processing have grown enormously in the past decade. Cold Plasma in Materials Fabrication is a comprehensive, up-to-date monograph which presents all aspects of cold, low-pressure plasmas.
The eight extensive chapters in this book cover the following topics:
- The main parameters and classifications of different types of plasma
- Reactions within cold plasmas and between cold plasmas and solid surfaces
- State-of-the-art methods for generation and diagnostics of cold plasmas and their application for processing of materials
This invaluable reference tool provides a helpful bibliography with suggestions for further reading on each subject. The book will be of importance to manufacturing engineers and scientists, as well as advanced students in engineering, materials, physics, and chemistry programs.
Customer Reviews:
excellent overview of the foundamentals.......2001-07-31
I checked this book out of the library (and 7 others on plasma) when I was first handed the new assignment of covering plasma tools. This stood out head and shoulders above the others for being readable, covering broad topics yet giving relevant details, and best of all offering lists of excellent references upon each topic. Thus, when I found the topic I was really interested in, I got a good overview and then directions to more in-depth coverage of that topic. I liked this book so much, I went an purchased my own copy for a desk reference.
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- History: Fiction or Science? (Chronology, No. 1)
- History: Fiction or Science? (Chronology, No. 1)
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- History: Fiction or Science? (Chronology, No. 1)
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