Lecture Notes on Principles of Plasma Processing

Book Description

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. The included CD contains a copy of the book which can be indexed using a Search function, and which can be enlarged on a monitor for a closer look at the diagrams. Sample homework and exam problems can also be found on the CD.

This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Physical Kinetics (Pergamon International Library of Science, Technology, Engineering, and Social Studies) (Course of Theoretical Physics)

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A UNIQUE BOOK ABOUT SYSTEMS NOT IN EQUILIBRIUM
A UNIQUE BOOK ABOUT SYSTEMS NOT IN EQUILIBRIUM

Physical Kinetics (Pergamon International Library of Science, Technology, Engineering, and Social Studies) (Course of Theoretical Physics)
E M Lifshitz , and L P Pitaevskii
Manufacturer: Butterworth-Heinemann
ProductGroup: Book
Binding: Paperback

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ASIN: 0750626356

Book Description

This volume is mainly concerned with a systematic development of the theory of plasmas, the authority being firmly rooted in the pioneering work of Landau. Corresponding results are also given for partially ionized plasmas, relativistic plasmas, degenerate or non-ideal plasmas and solid state plasmas.

Customer Reviews:

A UNIQUE BOOK ABOUT SYSTEMS NOT IN EQUILIBRIUM.......1999-04-16

This book is the volume 10 and the last volume of the great Course of Theoretical Physics by Landau and Lifshitz. It explains in great detail and rigour the theory of the processes ocurring in several systems not in statistical equilibrium. The book opens with a complete account of the transport processes in gases not in equilibrium, certainly the most representative physical system not in equilibrium. The Boltzmann transport equation is derived in a general and elegant way in this chapter. After a second chapter which developes a mathematical technique called the diffusion approximation, the book discusses various processes occurring in several systems not in equilibrium, notably the processes occurring in plasmas. Other systems, such as insulators, quantum liquids, metals etc are discussed. In a final chapter, it developes the kinetics of phase transitions, in a magnific and concise form. Really this is a superb book, where the reader will learn with detail all these subjects.

A UNIQUE BOOK ABOUT SYSTEMS NOT IN EQUILIBRIUM.......1999-04-16

Glow Discharge Processes: Sputtering and Plasma Etching

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Mixed feelings
Great fundamental reference
Good introductory book, too expensive

Glow Discharge Processes: Sputtering and Plasma Etching
Brian Chapman
Manufacturer: Wiley-Interscience
ProductGroup: Book
Binding: Hardcover

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ASIN: 047107828X

Book Description

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications—practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Customer Reviews:

Mixed feelings.......2001-07-16

I wholeheartly recomend this book to someone just starting out in plasma processing. It is THE best introductory book on the subject.

However, if you have read the literature and have been exposed to the subject for a while, you will find that the book is very basic and a little outdated. Chapman used to be the VP of Technology for a Plasma Etch firm when he wrote the 1st edition. Now he is (and has for some time been) President of a vacuumn diagnostics company. He really has not been updating this. With that caveat, if the other books/literature is "over your head" - go to this book for simply to understand explanations of so called "low temperature" plasma phenemena.

Great fundamental reference.......2000-08-22

While the specifics of various systems is dated, this is a great reference for the basics of plasma processing. Even though the equipment I use today is significantly more advanced I continually refer to this work for baseline information. The explanations are clear and well written. A rare example of a reference / textbook one can actually read.

Good introductory book, too expensive.......1999-05-06

This is the ideal book for beginning students attempting to navigate the maze of plasma physics for the first time. The book concentrates on developing an intuitive feel for ionized gases while including enough real physics to back up the intuition with numbers. It's unfortunate that the publisher has priced this work out of the range of the average student for whom it would be so useful.

X-Rays From Laser Plasmas: Generation and Applications

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Excellent Text

X-Rays From Laser Plasmas: Generation and Applications
I. C. E. Turcu , and J. B. Dance
Manufacturer: Wiley
ProductGroup: Book
Binding: Hardcover

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ASIN: 0471983977

Book Description

Soft X-rays have great potential for use in a wide variety of applications, including the semiconductor industry and the life sciences. X-Rays from Laser Plasmas: Generation and Applications focuses exclusively and in detail on the science and technology of soft X-rays produced with non-synchrotron sources. Using a minimum of mathematical formulae, it discusses how such X-rays can be efficiently and economically generated from plasmas produced by lasers, and how they interact with matter. Authored by Dr Edmond Turcu, one of the pioneers in this field, X-Rays from Laser Plasmas: Generation and Applications will be of great interest to a wide variety of readers, including all those working in X-ray lithography, microscopy, and radiobiology.

Customer Reviews:

Excellent Text.......2004-04-26

Very informative, and well written book. Wish I had bought it sooner. I've spent $1000s on professional publications from SPIE, AIP, and others and I find myself grabbing this text first. If working with plasma based X-ray generation is up your alley, go straight to this book for the quick and dirty.

Average customer rating:

excellent text, 5 stars if it wasn't for the typos
book for plasma engineers

Plasma Physics and Engineering
Alexander A. Fridman , and Lawrence A. Kennedy
Manufacturer: CRC
ProductGroup: Book
Binding: Hardcover

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ASIN: 1560328487

Book Description

Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear fundamental introduction to virtually all aspects of modern plasma science and technology. These areas include: plasma chemistry and engineering, combustion, chemical physics, lasers, electronics and new methods of material treatment, fuel conversion and environmental control.

The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and a large number of problems and concept questions. As a foundational text, Plasma Physics and Engineering is ideal for senior undergraduate and graduate students in mechanical, chemical and electrical engineering, as well as for scientists and engineers studying phenomena taking place in cold and thermal discharge plasmas, in combustion, and laser systems.

Customer Reviews:

excellent text, 5 stars if it wasn't for the typos.......2006-11-04

This is a great reference, with wonderful physical insight into plasma kinetics mechanisms. Unfortunately the astonishing work of the authors is undermined by minor typos from the editor, which may throw off beginners- equations where charges or species don't add up, and the like. I could not find an errata yet, therefore only the 4 stars; but sincere congrats to the authors for such indepth and insightful work.

book for plasma engineers.......2004-05-27

This book focuses on the most important and fundamental issues of
plasma physics and applications in today's industry. It provides an
excellent introduction and overview of plasma. It covers almost all
aspects of plasma physics and engineering and has a lot of useful
examples.

In this book, author gave a thorough consideration of the theory of
breakdown phenomena leading to formation of different plasma
discharges and finally covered, in considerable depth, the physics and
main features behind the major discharges intensively used in
cutting-edge technologies. Along with the well known material, the
most interesting and important innovations in area of plasma physics
are also gathered and discussed.

Book Description

The vacuum arc is a high current, low voltage electrical discharge between two electrodes situated in a vacuum ambient. The vacuum arc is distinguished from other electrical discharges in that the discharge itself creates the plasma medium which conducts its electrical current. Explaining how this self-organization wonder comes about, and how this phenomena can be used for practical applications are objectives of this book.

Vacuum Arc Science and Technology is a comprehensive text describing the basic physics and technological applications of vacuum arcs. These high current electrical discharges create their own conducting medium by vaporizing and ionizing material from the arc electrodes, to form an energetic, highly ionized, metal vapor plasma.

Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant inter-electrode plasma.

Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.

This text represents the first major update on both the physics of the cathodic arc and the technology and applications of arc devices. The previous major text by Lafferty, Vacuum Arcs, Theory and Application, was published 14 years ago and arc science and technology has since made considerable headway. The book covers the known facts of the cathodic arc and contributions by experts in the field discuss some of the theoretical models presently available.

The processes of thin film growth are covered and discussed in the context of the attractive features of low energy ion fluxes emanating from the cathodic spot. The technological problems of filtering undesirable micro-droplets from the arc plasma are discussed in relation to evaporation source design. Also discussed for the first time are some of the unique developments in arc technology that have taken place in the previous Soviet Union. Emphasis has also been placed on the properties of thin films deposited by arc evaporation, applications for such coatings and emerging opportunities for arc technology.

This book will be of great value to research workers in the field, the student requiring back- ground information on this emerging technology, the industrial worker presently using arc evaporation and/or complementary deposition techniques or considering its use. The book represents the state of the art of arc science and technology as presented by leading expert scientists working in theoretical and experimental areas.

Customer Reviews:

Review of Handbook of Vacuum Arc Science.......2002-05-09

This book should remain the seminal work on the subject of vacuum (and low-pressure gaseous) cathodic and anodic arcs for some time to come. One major plus is the significant number of Russian contributors. The Russians have made many contributions to this field but their work is seldom recognized. It is to the editors credit that they overcame the problems associated with incorporating their work in this book. The book has a chapter on the deposition of coatings, primarily reactive deposition of hard coatings, using arc sources. I think that one thing that is missing from the treatment is the effect of the arc on plasma chemistry. Arcs are very efficient in "activating" reactive gases and decomposing chemical vapor precursors which is important in reactive deposition processes. The cathodic arc also has the advantage in coating deposition that it moves over the whole target surface and thus prevents "poisoning" of some areas on the target surface which can be a problem in magnetron reactive sputter deposition.

Review of Handbook of Vacuum Arc Science.......2002-05-09

Plasma Electronics: Applications in Microelectronic Device Fabrication (Series in Plasma Physics)

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Plasma Electronics: Applications in Microelectronic Device Fabrication (Series in Plasma Physics)
T. Makabe , and Z. Petrovic
Manufacturer: Taylor & Francis
ProductGroup: Book
Binding: Hardcover

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ASIN: 0750309768

Book Description

Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagnosis. Plasma Electronics: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods necessary to bring these technologies from the laboratory to the factory. Beginning with an overview of the basic characteristics and applications of low-temperature plasma, preeminent experts Makabe and Petrovic explore the physics underlying the complex behavior of non-equilibrium (or low temperature) plasma. They discuss charged particle transport in general and in detail as well as macroscopic plasma characteristics and elementary processes in gas phase and on surfaces. After laying this groundwork, the book examines state-of-the-art computational methods for modeling plasma and reviews various important applications including inductively and capacitively coupled plasma, magnetically enhanced plasma, and various processing techniques, while numerous problems and worked examples reinforce the concepts. Uniquely combining physics, numerical methods, and practical applications, Plasma Electronics: Applications in Microelectronic Device Fabrication equips you with the knowledge necessary to scale up lab bench breakthroughs into industrial innovations.

Thin-Film Deposition: Principles and Practice

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Good book for a beginner in thin film deposition

Thin-Film Deposition: Principles and Practice
Donald L. Smith
Manufacturer: McGraw-Hill Professional
ProductGroup: Book
Binding: Hardcover

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ASIN: 0070585024

Book Description

Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.

Customer Reviews:

Good book for a beginner in thin film deposition.......2004-03-26

I recommend this book to anyone who is interested in process technologies that are used in chipmaking. The chapters are organized well and points are explained in a clear concise way. I am a chemistry major and this book helped me get started in my first job in a chipmaking company.

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Controlled Fusion and Plasma Physics
Kenro Miyamoto
Manufacturer: Taylor & Francis
ProductGroup: Book
Binding: Hardcover

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ASIN: 1584887095

Book Description

Resulting from ongoing, international research into fusion processes, the International Tokamak Experimental Reactor (ITER) is a major step in the quest for a new energy source. The first graduate-level text to cover the details of ITER, Controlled Fusion and Plasma Physics introduces various aspects and issues of recent fusion research activities through the shortest access path. The distinguished author breaks down the topic by first dealing with fusion and then concentrating on the more complex subject of plasma physics. The book begins with the basics of controlled fusion research, followed by discussions on tokamaks, reversed field pinch (RFP), stellarators, and mirrors. The text then explores ideal magnetohydrodynamic (MHD) instabilities, resistive instabilities, neoclassical tearing mode, resistive wall mode, the Boltzmann equation, the Vlasov equation, and Landau damping. After covering dielectric tensors of cold and hot plasmas, the author discusses the physical mechanisms of wave heating and noninductive current drive. The book concludes with an examination of the challenging issues of plasma transport by turbulence, such as magnetic fluctuation and zonal flow. Controlled Fusion and Plasma Physics clearly and thoroughly promotes intuitive understanding of the developments of the principal fusion programs and the relevant fundamental and advanced plasma physics associated with each program.

Plasma Surface Modification and Plasma Polymerization

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Plasma Surface Modification and Plasma Polymerization
Norihiro Inagaki
Manufacturer: CRC
ProductGroup: Book
Binding: Hardcover

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ASIN: 1566763371

Book Description

In current materials R&D, high priority is given to surface modification techniques to achieve improved surface properties for specific applications requirements. Plasma treatment and polymerization are important technologies for this purpose. This book provides a basic and thorough presentation of this subject. This is probably the first book to cover plasma treatment and polymerization for the purpose of surface modification. Chemistry, processes and applications are detailed. More than 150 figures include numerous schematics which illustrate the chemistry and processes. More than 100 tables and graphics provide useful reference data in convenient form.

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