Lecture Notes on Principles of Plasma Processing

Book Description

Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. The included CD contains a copy of the book which can be indexed using a Search function, and which can be enlarged on a monitor for a closer look at the diagrams. Sample homework and exam problems can also be found on the CD.

This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

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Gas Discharge Physics
Yuri P. Raizer
Manufacturer: Springer
ProductGroup: Book
Binding: Hardcover

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Principles of Plasma Discharges and Materials Processing , 2nd Edition
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Here is both a textbook for beginners and a handbook for specialists in plasma physics and gaseous electronics. The book contains much useful data: results of experiments and calculations, and reference data. It provides estimates of typical parameters and formulas in forms suitable for computations. Gas discharges of all important types are discussed: breakdown, glow, arc, spark and corona at radio frequency, microwave and optical frequences. The generation of plasma, and its application to high power gas lasers are treated in detail.

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Physics of Intense Beams in Plasmas (Series on Plasma Physics)
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ASIN: 0750301864

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Physics of Intense Beams in Plasmas is a comprehensive description of the interaction between extremely intense particle beams and plasmas. The emphasis is on experimental beam-plasma physics, but the necessary theory is also explained-much of which is innovative and original. Central to the book is the discussion of beam instabilities, emphasizing their hydrodynamic nature.

Plasma Processes and Plasma Kinetics: 580 Worked-Out Problems for Science and Technology (Physics Textbook)

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Plasma Processes and Plasma Kinetics: 580 Worked-Out Problems for Science and Technology (Physics Textbook)
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ASIN: 3527406816

Book Description

This problems supplement to plasma physics textbooks covers plasma theory for both science and technology.
Written by a renowned plasma scientist, experienced book author and skilled teacher, it treats all aspects of plasma theory in no fewer than 520 very detailed worked-out problems. With this systematic collection the reader will gain a sound understanding of plasma physics in all fields, from fusion and astrophysics to surface treatment. The book also includes the transport of particles as well as radiation in plasmas, and while designed for graduate students and young researchers, it can equally serve as a reference.

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Auroral Plasma Physics (Space Sciences Series of ISSI)

Manufacturer: Springer
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This volume gives a broad synthesis of the current knowledge and understanding of the plasma physics behind the aurora. The aurora is not only one of the most spectacular natural phenomena on Earth, but the underlying physical processes are expected to be ubiquitous in the plasma universe. Recognizing the enormous progress made over the last decade) through in situ and groundbased measurements as well as theoretical modelling, it seemed timely to write the first comprehensive and integrated book on the subject. Recent advances concern the clarification of the nature of the acceleration process of the electrons that are responsible for the visible aurora, the recognition of the fundamental role of the large-scale current systems in organizing the auroral morphology, and of the interplay between particles and electromagnetic fields.

Plasma Dynamics (Applications of Mathematics)

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Plasma Dynamics (Applications of Mathematics)
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Principles of Plasma Discharges and Materials Processing , 2nd Edition

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outstanding plasma resource
Overrated
The book provides an excellent overview of plasma processing
An excellent overview of common plasma processing devices
Very Good Theoretical Coverage of Plasma's, including ECR

Principles of Plasma Discharges and Materials Processing , 2nd Edition
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Manufacturer: Wiley-Interscience
ProductGroup: Book
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Book Description

A Thorough Update of the Industry Classic on Principles of Plasma Processing

The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.

The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters.

New and expanded topics include:
* Updated cross sections
* Diffusion and diffusion solutions
* Generalized Bohm criteria
* Expanded treatment of dc sheaths
* Langmuir probes in time-varying fields
* Electronegative discharges
* Pulsed power discharges
* Dual frequency discharges
* High-density rf sheaths and ion energy distributions
* Hysteresis and instabilities
* Helicon discharges
* Hollow cathode discharges
* Ionized physical vapor deposition
* Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Download Description

A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.

Customer Reviews:

outstanding plasma resource.......2007-01-16

One of the most practical and comprehensive resources on plasma phyics and engineering. The book is much easier to understand and more in depth than most other books on the subject, except for maybe chen (who takes more of a physics approach, whereas lieberman takes more of an engineering approach) This book is a must have for anyone working with or studying plasmas.

Overrated.......2000-05-05

As a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the $90.00. Spend your money elsewhere

The book provides an excellent overview of plasma processing.......1998-12-10

This book provides an excellent introduction and overview of plasma discharges applied to semiconductor manufacturing. It is well-organized, clearly-written and full of useful examples and exercises. And unlike many books on plasma physics, it is not overly-mathematical and contains many useful physical insights. I strongly recommend this book for anyone wanting to review the field of plasma processing.

An excellent overview of common plasma processing devices.......1998-12-10

Lieberman covers many of the standard processing devices and much of the physics needed to model them effectively.

The presentation is clear and extremely useful both as a reference and as a tutorial. A must-have book for anyone interested in plasma processing.

Very Good Theoretical Coverage of Plasma's, including ECR.......1998-05-02

This book provides a theoretical overview of plasma's, including coverage of ECR applications. This was very valuable for Hitachi Etchers. The theory is presented at an undergraduate level and assumes the reader has knowledge of vector analysis. Highly recommended for any Etch Process Engineer in the Semiconductor Industry.

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Principles of Magnetoplasma Dynamics
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Manufacturer: Oxford University Press, USA
ProductGroup: Book
Binding: Hardcover

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Book Description

Controlled fusion research explores the properties of man-made plasmas confined in toroidal machines (tokamaks) by intense magnetic fields. Beginning with the elementary principles, the author gives a rigorous and complete demonstration of the theory of magnetoplasmas. He then builds on this
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followed by exercises and notes on the mathematics. This book is be an excellent base for a graduate course on plasma physics, and will interest researchers in both applied and plasma physics.

Theory of Mode Conversion and Tunneling in Inhomogeneous Plasmas

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Theory of Mode Conversion and Tunneling in Inhomogeneous Plasmas
D. G. Swanson
Manufacturer: Wiley-Interscience
ProductGroup: Book
Binding: Hardcover

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Plasma Waves, 2nd Edition (Series in Plasma Physics)

ASIN: 0471247766

Book Description

A fresh look at the phenomenon of mode conversion with tunneling.

This volume provides a thorough analysis of plasma wave resonance absorption--a mode conversion process used in wave heating and diagnostics worldwide. The only book to incorporate mode conversion into a general treatment of plasma physics and plasma waves, it describes a broad range of applications and develops methods of mode conversion that are more advanced and precise than others in use today. This monograph presents the complete theory underlying the diagnostic implications of the process, combining estimates of tunneling, reflection, conversion, and absorption with emission. It surveys two decades' worth of developments in the field and:
* Brings together a wealth of information previously scattered in the professional literature
* Details numerous analytical and numerical results, many of which are published here for the first time
* Proves the surprising result that the phenomena of tunneling and absorption are independent
* Shows the link between the absorption and emission processes associated with resonances
* Features dozens of illustrations, as well as an extensive bibliography and references
* Appends a collection of mathematical formulas useful in plasma physics
* Offers via e-mail a variety of Fortran codes covering the examples in the book.

Theory of Mode Conversion and Tunneling in Inhomogeneous Plasmas is an essential reference for researchers working in plasma physics, space plasma physics, and fusion energy fields, and for anyone developing codes in plasma wave heating modeling. Its tutorial approach makes it invaluable for graduate students taking courses in plasma waves--whether in physics, electrical engineering, or nuclear engineering.

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A very readable collection of papers

Dreams, Stars, and Electrons
Edited by Lyman Spitzer, Jr., and Jeremiah P. Ostriker
Manufacturer: Princeton University Press
ProductGroup: Book
Binding: Paperback

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ASIN: 0691027978
Release Date: 2007-02-05

Book Description

Lyman Spitzer, Jr., is a leading astronomer whose work has revolutionized our understanding of interstellar space and plasma physics. In addition, his proposals for a large telescope in space led after many decades to the Hubble Space Telescope. Dreams, Stars, and Electrons contains some thirty of his papers, selected mainly for their relevance to present research. Some of these works have previously not been readily available. A commentary by the author, preceding each paper, gives interesting background information and summarizes some more recent work. Part I of the book is devoted to twelve papers on the gas and dust in interstellar space, beginning with the author's theory (now accepted fact) that this interstellar material in spiral galaxies is the birthplace of young stars. The final interstellar paper summarizes the extensive results obtained by the Princeton/NASA Copernicus satellite. In Part II eight papers discuss problems of stellar dynamics, including systematic acceleration of stars in random passage near interstellar clouds. Other papers analyze the evolution of a spherical cluster in the absence of external perturbations. Part III deals primarily with the early development and present performance of the Hubble telescope; and Part IV, with plasma physics, including controlled fusion. More personal writings are included in Part V. Lyman Spitzer, Jr., is Professor Emeritus of Astronomy at Princeton University and was Director of the Princeton University Observatory for some thirtyfive years. Jeremiah P. Ostriker is Charles A. Young Professor of Astronomy and is Provost of Princeton University.

Customer Reviews:

A very readable collection of papers.......2004-10-08

Lyman Spitzer was the author of several interesting books, including "The Physics of Fully Ionized Gases," "Physical Processes in the Interstellar Medium," and "Dynamical Evolution of Globular Clusters." This volume is a collection of Spitzer's best papers, written with wonderful clarity, and it covers all of these topics, as well as a paper on the physics of sound in the sea. In addition, there are a couple of papers about space telescopes, including his pioneering work on the subject from 1946. The Spitzer Space Telescope, an infrared observatory that was launched in 2003, was named for him.

I sincerely recommend this book for anyone interested in space physics or galactic astronomy.

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